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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16b.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZGivnK2Y/NnmPt
Repositóriosid.inpe.br/mtc-m17@80/2006/12.05.17.37   (acesso restrito)
Última Atualização2007:06.28.15.10.44 (UTC) administrator
Repositório de Metadadossid.inpe.br/mtc-m17@80/2006/12.05.17.37.16
Última Atualização dos Metadados2018:06.05.03.33.56 (UTC) administrator
Chave SecundáriaINPE-14763-PRE/9734
ISSN0257-8972
Chave de CitaçãoTanUedOliDalReu:2007:PlImIo
TítuloPlasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fields
Ano2007
MêsFeb.
Data de Acesso21 maio 2024
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho400 KiB
2. Contextualização
Autor1 Tan, Ing Hwie
2 Ueda, M¨¢rio
3 Oliveira, Rogerio Moares de
4 Dallaqua, Renato S¨¦rgio
5 Reuther, H.
Identificador de Curriculo1 8JMKD3MGP5W/3C9JHDC
Grupo1 LAP-INPE-MCT-BR
2 LAP-INPE-MCT-BR
3 LAP-INPE-MCT-BR
4 LAP-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Research Center Rossendorf, Institute of Ion Beam Physics and Materials Research
RevistaSurface and Coatings Technology
Volume201
Número9/11
Páginas4826-4831
Histórico (UTC)2007-12-19 15:44:34 :: simone -> administrator ::
2012-11-24 01:39:31 :: administrator -> simone :: 2007
2013-02-20 15:19:54 :: simone -> administrator :: 2007
2018-06-05 03:33:56 :: administrator -> marciana :: 2007
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Palavras-ChavePlasma immersion ion implantation (PIII)
Vacuum arc
Magnetic suppression
Double probes
ResumoThe influence of low magnetic fields (B ¡Ü 130 G) on the plasma parameters of a DC nitrogen glow discharge is investigated with a double Langmuir probe. The discharge was optimized for maximum plasma density for different values of a magnetic field, and a condition was found in which density was enhanced by an order of magnitude. In this condition partial suppression of secondary electron emission was obtained during ion implantation experiments. Silicon samples implanted in this optimum density condition showed larger retained dose and penetration depth compared with samples treated in non-magnetized plasmas as shown by Auger electron spectroscopy depth profile analysis. These results were compared with previous similar experiments in much denser magnetized vacuum arc plasmas, in which total suppression of secondary electrons (SE) was obtained, corroborating the theory that the maintenance of a virtual cathode for SE suppression is favored by higher plasma density. Silicon samples implanted in magnetized magnesium plasmas exhibited much larger doses (as expected) and penetration depths (not so obvious) than the ones treated in non-magnetized plasmas. The deeper ion penetration obtained in magnetized gaseous and vacuum arc plasmas indicates that an enhanced diffusion may be taking place induced by the large ion bombardment in dense plasmas.
ÁreaFISPLASMA
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Conteúdo da Pasta docacessar
Conteúdo da Pasta sourcenão têm arquivos
Conteúdo da Pasta agreementnão têm arquivos
4. Condições de acesso e uso
Idiomaen
Arquivo Alvoplasma immersion.pdf
Grupo de Usuáriosadministrator
simone
Visibilidadeshown
Detentor da CópiaSID/SCD
Política de Arquivamentodenypublisher denyfinaldraft24
Permissão de Leituradeny from all and allow from 150.163
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
DivulgaçãoWEBSCI; PORTALCAPES.
Acervo Hospedeirolcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Controle da descrição
e-Mail (login)marciana
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